Silicon technologies : ion implantation and thermal treatment / edited by Annie Baudrant.

Contributor(s):

Baudrant, Annie

Publication details: London : Wiley, 2011.Description: xvii, 337 p. : ill. ; 24 cmISBN:

9781848212312 (hbk)

Subject(s):

Summary: The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Holdings
Item type	Current library	Home library	Call number	Materials specified	Copy number	Status	Date due	Barcode
AM	PERPUSTAKAAN LINGKUNGAN KEDUA	PERPUSTAKAAN LINGKUNGAN KEDUA KOLEKSI AM-P. LINGKUNGAN KEDUA	TK7871.85.S555 3 (Browse shelf(Opens below))		1	Available		00002078296

Includes bibliographical references and index.

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Silicon technologies : ion implantation and thermal treatment / edited by Annie Baudrant.

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