Silicon technologies : ion implantation and thermal treatment /
Silicon technologies : ion implantation and thermal treatment /
edited by Annie Baudrant.
- London : Wiley, 2011.
- xvii, 337 p. : ill. ; 24 cm.
Includes bibliographical references and index.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
9781848212312 (hbk)
2011-008131
015786521 Uk
Semiconductor doping.
Ion implantation.
Semiconductors--Heat treatment.
Includes bibliographical references and index.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
9781848212312 (hbk)
2011-008131
015786521 Uk
Semiconductor doping.
Ion implantation.
Semiconductors--Heat treatment.