| 000 | 00965nam a2200289 a 4500 | ||
|---|---|---|---|
| 005 | 20250913130414.0 | ||
| 008 | 981208s1980 nyu 00 0 eng d | ||
| 020 |
_a047107828X _c26.95 (est.) |
||
| 039 | 9 |
_a201107041715 _bzarina _y08-18-1999 _zload |
|
| 040 | _aUKM | ||
| 090 | _aQC702.7.P6C48 | ||
| 090 |
_aQC702.7.P6 _bC48 |
||
| 100 | 1 | _aChapman, Brian NPlasma etching | |
| 245 | 1 | 0 |
_aGlow discharge processes : _bsputtering and plasma etching / _cBrian Chapman |
| 260 |
_aNew York : _bWiley, _c1980 |
||
| 300 |
_a406p. : _bill. ; _c24 cm. |
||
| 500 | _a'A Wiley-Interscience publication.' | ||
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 | _aSputtering (Physics) | |
| 650 | 0 | _aGlow discharges | |
| 907 |
_a.b10877381 _b2021-05-28 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kQC702.7.P6C48 |
||
| 914 | _avtls000091152 | ||
| 991 | _aFakulti Sains Fizik dan Gunaan | ||
| 998 |
_at _b1999-05-08 _cm _da _feng _gnyu _y0 _z.b10877381 |
||
| 999 |
_c89580 _d89580 |
||