| 000 | 01037nam a2200301 a 4500 | ||
|---|---|---|---|
| 005 | 20250913120917.0 | ||
| 008 | 981208s1984 ne a 001 0 eng | ||
| 020 | _a0444869050 | ||
| 039 | 9 |
_a201212171819 _bzaina _c200904021136 _dadnan _y08-18-1999 _zload |
|
| 040 | _dUKM | ||
| 090 | _aTK7871.85.D79 3 | ||
| 090 |
_aTK7871.85 _b.D79 |
||
| 090 |
_aTK7871.85 _b.D79 3 |
||
| 245 | 0 | 0 |
_aDry etching for microelectronics / _cedited by Ronald A. Powell. |
| 260 |
_aAmsterdam : _bNorth-Holland Publishing Company, _c1984. |
||
| 300 |
_a299 p. : _bill. ; _c24 cm. |
||
| 440 | 0 |
_aMaterials processing theory and practices ; _vv.4. |
|
| 504 | _aIncludes bibliographical references and index. | ||
| 650 | 0 |
_aSemiconductors _xEtching. |
|
| 650 | 0 | _aPlasma etching. | |
| 700 | 1 | _aPowell, Ronald A. | |
| 907 |
_a.b10593718 _b2020-10-15 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTK7871.85.D79 3 |
||
| 914 | _avtls000061724 | ||
| 991 | _aFakulti Sains Fizik dan Gunaan | ||
| 998 |
_al _at _b1999-05-08 _cm _da _feng _gne _y0 _z.b10593718 |
||
| 999 |
_c61287 _d61287 |
||