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020 _a0444633049
_c(set : hardback)
020 _a9780444633040
_qhardback (set)
_cRM 1724.68
020 _a9780444633392
_c(volume 3 : hardback)
020 _a9780444633385 (volume 3 : hardback)
039 9 _a201608121012
_bhaiyati
_c201608121002
_dhaiyati
_c201607191523
_drasyilla
_y04-06-2016
_zrasyilla
040 _aYDXCP
_beng
_erda
_cYDXCP
_dOUN
_dUKM
_erda
090 _aQD921.H363 2015
090 _aQD921
_b.H363 2015
245 0 0 _aHandbook of crystal growth, Volume III :
_bThin films and epitaxy /
_ceditor-in-chief, Tatau Nishinga ; volume editor, Thomas F. Kuech.
246 3 _aThin films and epitaxy.
250 _aSecond edition.
264 1 _aAmsterdam, The Netherlands ;
_aWaltham, Massachusetts, USA :
_bElsevier,
_c2015.
300 _a2 volumes (xvii, 1346 pages) :
_billustrations ;
_c25 cm.
336 _atext
_2rdacontent.
337 _aunmediated
_2rdamedia.
338 _avolume
_2rdacarrier.
500 _aFirst edition published in 1993 : 2 volumes published in Amsterdam, The Netherlands, by North-Holland; and 1 volume published in Amsterdam by Elsevier.
504 _aIncludes bibliographical references and index.
505 0 _a[Volume 1] Part IIIA. Basic techniques -- [volume 2] Part IIIB. Materials, processes, and technology.
650 0 _aCrystal growth.
650 0 _aEpitaxy.
650 0 _aSemiconductors.
700 1 _aNishinga, Tatau,
_eeditor.
700 1 _aKuech, T. F.,
_eeditor.
740 0 2 _aBasic techniques.
740 0 2 _aMaterials, processes, and technology.
907 _a.b16304032
_b2019-11-12
_c2019-11-12
942 _c01
_n0
_kQD921.H363 2015
914 _avtls003603784
990 _anh
991 _aFakulti Sains dan Teknologi
998 _at
_b2016-06-04
_cm
_da
_feng
_gne
_y0
_z.b16304032
999 _c607956
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