| 000 | 01332nam a22003374a 4500 | ||
|---|---|---|---|
| 005 | 20250918162034.0 | ||
| 008 | 120515s2011 enka b 001 0 eng | ||
| 010 | _a2011-008131 | ||
| 016 | 7 |
_a015786521 _2Uk |
|
| 020 | _a9781848212312 (hbk) | ||
| 039 | 9 |
_a201208021147 _bbaiti _c201207131004 _didah _c201205151733 _didah _y05-15-2012 _zidah |
|
| 040 | _aUKM | ||
| 090 | _aTK7871.85.S555 3 | ||
| 090 |
_aTK7871.85 _b.S555 |
||
| 245 | 0 | 0 |
_aSilicon technologies : _bion implantation and thermal treatment / _cedited by Annie Baudrant. |
| 260 |
_aLondon : _bWiley, _c2011. |
||
| 300 |
_axvii, 337 p. : _bill. ; _c24 cm. |
||
| 504 | _aIncludes bibliographical references and index. | ||
| 520 | _aThe main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. | ||
| 650 | 0 | _aSemiconductor doping. | |
| 650 | 0 | _aIon implantation. | |
| 650 | 0 |
_aSemiconductors _xHeat treatment. |
|
| 700 | 1 | _aBaudrant, Annie. | |
| 907 |
_a.b15363430 _b2019-11-12 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTK7871.85.S555 3 |
||
| 914 | _avtls003500770 | ||
| 990 | _abaiti | ||
| 991 | _aFakulti Kejuruteraan dan Alam Bina | ||
| 998 |
_al _b2012-02-05 _cm _da _feng _genk _y0 _z.b15363430 |
||
| 999 |
_c520051 _d520051 |
||