000 01852nam a2200421 i 4500
005 20250918145423.0
008 111015m ne a 001 0 eng d
020 _a9781437778304
_qvolume 2
_cRM736.80
020 _a9780323313032
_qhardback
_qvolume 7
_cRM988.24
039 9 _a201610201103
_bhayat
_c201610201103
_dhayat
_c201609271611
_dasrul
_c201609231012
_dasrul
_y10-15-2011
_zmazarita
040 _aUKM
_erda
090 _aTA418.7.D449
090 _aTA418.7
_b.D449
245 0 0 _aDevelopments in surface contamination and cleaning /
_cedited by Rajiv Kohli and Kashmiri L. Mittal.
264 1 _aAmsterdam :
_bElsivier,
_c2008-
300 _a2 volumes :
_billustrations ;
_c24 cm.
490 1 _aDevelopments in surface contamination and cleaning series ;
_v2
490 1 _aDevelopments in surface contamination and cleaning series ;
_v7
504 _aIncludes references and index.
505 0 _gvol. 2.
_tParticle deposition, control and removal -
_gvol. 7.
_tCleanliness validation and verification.
650 0 _aSurfaces (Technology).
650 0 _aSurface contamination
_xPrevention.
650 0 _aParticles
_xMeasurement.
700 1 _aKohli, Rajiv,
_eeditor.
700 1 _aMittal, Kashmiri L.,
_eeditor.
740 0 _aParticle deposition, control and removal ;
_nvolume 2.
740 0 _aCleanliness validation and verification ;
_nvolume 7.
830 0 _aDevelopments in surface contamination and cleaning series;
_v2
830 0 _aDevelopments in surface contamination and cleaning series;
_v7
907 _a.b15175856
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTA418.7.D449
914 _avtls003480785
990 _armh/aa
991 _aInstitut Kejuruteraan Mikro dan Nanoelektronik (IMEN) - Pasca
991 _aFakulti Sains dan Teknologi
998 _al
_at
_b2011-02-10
_cm
_da
_feng
_gne
_y0
_z.b15175856
999 _c501821
_d501821