000 01250nam a2200337 a 4500
005 20250918142209.0
008 110610s2011 gw a 001 0 eng
020 _a9783527316960 (hbk.)
_cRM494.19
039 9 _a201106220841
_bzabidah
_c201106161228
_dfati
_y06-10-2011
_zrasyilla
040 _aUKM
090 _aTP155.75.D966 3
090 _aTP155.75
_b.D966 3
245 0 0 _aDynamic process modeling /
_cedited by Michael C. Georgiadis, Julio R. Banga, and Efstratios N. Pistikopoulos
246 3 4 _aDynamic process modelling
260 _aWeinheim :
_bWiley-VCH,
_c2011
300 _axxv, 601 p. :
_bill. ;
_c25 cm.
490 1 _aProcess systems engineering ;
_vvol. 7
650 0 _aChemical process control
_xData processing
650 0 _aChemical process control
_xComputer simulation
700 1 _aGeorgiadis, Michael C.
700 1 _aBanga, Julio R.
700 1 _aPistikopoulos, Efstratios N.
830 0 _aProcess systems engineering ;
_vvol. 7
907 _a.b15057422
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTP155.75.D966 3
914 _avtls003468228
990 _afka/za
991 _aInstitut Kejuruteraan Mikro dan Nanoelektronik (IMEN)
998 _at
_b2011-10-06
_cm
_da
_feng
_ggw
_y0
_z.b15057422
999 _c490416
_d490416