| 000 | 01042nam a2200289 a 4500 | ||
|---|---|---|---|
| 005 | 20250918140626.0 | ||
| 008 | 111220s2008 nyua b 001 0 eng | ||
| 020 |
_a9781604567137 (hbk.) _cRM242.53 |
||
| 020 | _a1604567139 (hbk.) | ||
| 039 | 9 |
_a201112201244 _bzaina _c201111251130 _drasyilla _y05-04-2011 _zmazarita |
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| 040 | _aUKM | ||
| 090 | _aTK7871.99.M44W334 3 | ||
| 090 |
_aTK7871.99.M44 _bW334 |
||
| 245 | 0 | 0 |
_aWafer level reliability of advanced CMOS devices and processes / _cYi Zhao, editor |
| 260 |
_aNew York : _bNova Science Publishers, _c2008 |
||
| 300 |
_a195 p. : _bill. ; _c27 cm. |
||
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 | _aMetal oxide semiconductors, Complementary | |
| 700 | 1 | _aZhao, Yi | |
| 907 |
_a.b15027818 _b2021-05-28 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTK7871.99.M44W334 3 |
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| 914 | _avtls003465077 | ||
| 990 | _azsz | ||
| 991 | _aInstitut Kejuruteraan Mikro dan Nanoelektronik (IMEN) - Pasca | ||
| 998 |
_al _b2011-04-05 _cm _da _feng _gnyu _y0 _z.b15027818 |
||
| 999 |
_c487496 _d487496 |
||