000 01306cam a2200349 a 4500
005 20250918130135.0
008 110321s2010 nyua bi 001 0 eng
020 _a9781608761883 (hbk.)
_cRM261.13
020 _a1608761886 (hbk.)
039 9 _a201311281758
_blan
_c201103281446
_dariff
_y03-21-2011
_zmazarita
040 _aUKM
090 _aQC611.8.M4K377
090 _aQC611.8.M4
_bK377
100 1 _aKaschieva, S.,
_d1962-
245 1 0 _aRadiation defects in ion implanted and/or high-energy irradiated MOS structures /
_cS. Kaschieva and S.N. Dmitriev.
260 _aNew York :
_bNova Science Publishers,
_c2010.
300 _aix, 195 p. :
_bill. (some col.) ;
_c24 cm.
490 1 _aElectrical engineering developments series.
504 _aIncludes bibliographical references and index.
650 0 _aMetal oxide semiconductors.
650 0 _aSemiconductor doping.
650 0 _aSemiconductors
_xEffect of radiation on.
650 0 _aIon implantation.
700 1 _aDmitriev, S. N.,
_d1961-
830 0 _aElectrical engineering developments series.
907 _a.b14977576
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kQC611.8.M4K377
914 _avtls003459836
991 _aFakulti Sains & Teknologi
998 _at
_b2011-08-03
_cm
_da
_feng
_gnyu
_y0
_z.b14977576
999 _c482560
_d482560