000 01096cam a2200313 a 4500
005 20250918122610.0
008 101027s2009 waua bi 001 0 eng
020 _a9780819475602
_cRM291.35
039 9 _a201401281518
_blan
_c201101311543
_dzarina
_c201012171548
_dsanusi
_c201012151357
_dsanusi
_y10-27-2010
_zrahah
040 _aUKM
090 _aTK7872.M3L565 3
090 _aTK7872.M3
_b.L565 2009
090 _aTK7872.M3
_b.L565 2009 3
100 1 _aLin, Burn Jeng,
_d1942-
245 1 0 _aOptical lithography :
_bhere is why /
_cBurn J. Lin.
260 _aBellingham, Wash. :
_bSPIE,
_c2009.
300 _axiv, 477 p. :
_bill. ;
_c26 cm.
504 _aIncludes index.
650 0 _aMicrolithography.
650 0 _aSemiconductors
_xEtching.
650 0 _aLasers
_xIndustrial applications.
907 _a.b14823433
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTK7872.M3L565 3
914 _avtls003443671
991 _aFakulti Sains Sosial dan Kemanusiaan
991 _aFakulti Kejuruteraan dan Alam Bina
998 _al
_at
_b2010-01-10
_cm
_da
_feng
_gwau
_y0
_z.b14823433
999 _c469060
_d469060