000 01086nam a2200325 a 4500
005 20250918122537.0
008 101015s2009 nyua b 001 0 eng
020 _a9780071549189 (hbk.)
_cRM362.25
020 _a0071549188 (hbk.)
039 9 _a201010261508
_bzarina
_y10-15-2010
_zfarid
040 _aUKM
090 _aTK7872.M3E994
090 _aTK7872.M3
_bE994
245 0 0 _aExtreme ultraviolet lithography /
_c[edited by] Banqiu Wu, Ajay Kumar.
260 _aNew York :
_bMcGraw-Hill,
_c2009
300 _axiv, 465 p. :
_bill. ;
_c24 cm.
504 _aIncludes bibliographical references and index
650 0 _aExtreme ultraviolet lithography
650 0 _aIntegrated circuits
_xMasks
650 0 _aIntegrated circuits
_xDesign and construction
700 1 _aWu, Banqiu
700 1 _aKumar, Ajay,
_d1962-
907 _a.b14817093
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTK7872.M3E994
914 _avtls003443009
990 _aszj
991 _aPusat Pengajian Fizik Gunaan - QFG
998 _al
_b2010-02-10
_cm
_da
_feng
_gnyu
_y0
_z.b14817093
999 _c468431
_d468431