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020 _a0849339286 (alk. paper)
035 _a(OCoLC)ocm61463809
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082 0 0 _a621.3815/2
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090 _aTK7874.58
_b.B69 2006
100 1 _aBowen, D. Keith
_q(David Keith),
_d1940-
245 1 0 _aX-ray metrology in semiconductor manufacturing
_h[electronic resource] /
_cD. Keith Bowen, Brian K. Tanner
260 _aBoca Raton :
_bCRC/Taylor & Francis,
_c2006
500 _aAccess to 2http://www.egnetbase.com/ejournals/search/advsearch1.asp3 and type in the title. You may access the full text after you type in the advanced search screen
504 _aIncludes bibliographical references and index
650 0 _aSemiconductors
_xDesign and construction
_xQuality control
650 0 _aIntegrated circuits
_xMeasurement
650 0 _aSemiconductor wafers
_xInspection
650 0 _aX-rays
_xDiffraction
650 0 _aFluroscopy
700 1 _aTanner, B. K.
_q(Brian Keith)
856 4 0 _uhttps://eresourcesptsl.ukm.remotexs.co/login?url=http://www.egnetbase.com/ejournals/search/advsearch1.asp
856 4 0 _3CRCnetBASE
_uhttp://www.engnetbase.com/ejournals/books/book_km.asp?id=4809
_zClick here for the electronic version
907 _a.b14531513
_b2022-04-06
_c2019-11-12
942 _n0
_kTK7874.58 .B69 2006
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998 _ae
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