000 01950cam a22004334a 4500
005 20250918011711.0
006 m d
007 cr cn ---ancau
008 090702s2006 flua sb 001 0 eng
010 _a2005-024414
020 _a0849335434 (alk. paper)
035 _a(OCoLC)ocm61456530
035 _a14083018
039 9 _y07-02-2009
_zpuitm2
040 _aUKM
042 _apcc
082 0 0 _a621.3815/2
_222
090 _aTK7871.85
_b.S3965 2006
245 0 0 _aScientific wet process technology for innovative LSI/FPD manufacturing
_h[electronic resource] /
_cedited by Tadahiro Ohmi
260 _aBoca Raton, FL :
_bCRC/Taylor & Francis,
_c2006
500 _aAccess to 2http://www.egnetbase.com/ejournals/search/advsearch1.asp3 and type in the title. You may access the full text after you type in the advanced search screen
504 _aIncludes bibliographical references and index
650 0 _aSemiconductors
_xDesign and construction
650 0 _aSemiconductors
_xCleaning
650 0 _aIntegrated circuits
_xDesign and construction
700 1 _aOhmi, Tadahiro,
_d1939-
856 4 0 _uhttps://eresourcesptsl.ukm.remotexs.co/login?url=http://www.egnetbase.com/ejournals/search/advsearch1.asp
856 4 0 _3CRCnetBASE
_uhttp://www.engnetbase.com/ejournals/books/book_km.asp?id=5038
_zClick here for the electronic version
907 _a.b14530715
_b2022-04-06
_c2019-11-12
942 _n0
_kTK7871.85 .S3965 2006
914 _avtls003412864
906 _a7
_bcbc
_corignew
_d1
_eecip
_f20
_gy-gencatlg
990 _aLiza
998 _ae
_b2009-02-07
_cm
_dz
_feng
_gflu
_y0
_z.b14530715
999 _c445297
_d445297