| 000 | 01241cam a22003374a 4500 | ||
|---|---|---|---|
| 005 | 20250917235938.0 | ||
| 008 | 080813s2005 nyua bi 001 0 eng | ||
| 020 |
_a0824757882 (acid-free paper) _cRM682.31 |
||
| 039 | 9 |
_a200901071247 _bariff _c200812051125 _drahah _c200808131644 _didah _y08-13-2008 _zidah |
|
| 040 | _aUKM | ||
| 090 | _aQD381.8.Y378 3 | ||
| 090 |
_aQD381.8 _b.Y378 |
||
| 100 | 1 | _aYasuda, H. | |
| 245 | 1 | 0 |
_aLuminous chemical vapor deposition and interface engineering / _cHirotsugu Yasuda |
| 260 |
_aNew York : _bMarcel Dekker, _cc2005 |
||
| 300 |
_axii, 819 p. : _bill. ; _c27 cm. |
||
| 440 | 0 |
_aSurfactant science series ; _vv. 122 |
|
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 | _aPlasma polymerization | |
| 650 | 0 | _aChemical vapor deposition | |
| 650 | 0 | _aSurface chemistry | |
| 650 | 0 |
_aChemical engineering _xResearch |
|
| 856 | 4 | 2 |
_3Publisher description _uhttp://www.loc.gov/catdir/enhancements/fy0647/2005042468-d.html |
| 907 |
_a.b14259527 _b2020-10-15 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kQD381.8.Y378 3 |
||
| 914 | _avtls003384286 | ||
| 990 | _amaa | ||
| 991 | _aKejuruteraan Kimia & Proses (KKP) | ||
| 998 |
_al _b2008-01-08 _cm _da _feng _gnyu _y0 _z.b14259527 |
||
| 999 |
_c421111 _d421111 |
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