| 000 | 01065nam a2200301 a 4500 | ||
|---|---|---|---|
| 005 | 20250913112406.0 | ||
| 008 | 981208s1993 xxu 00 eng | ||
| 020 |
_a0750691727 _cRM226.82 |
||
| 039 | 9 |
_a200704171151 _bhayat _y08-18-1999 _zload |
|
| 090 | _aQC611.8.S5C48 | ||
| 090 | _aQC611.8 | ||
| 245 | 1 | 0 |
_aCharacterization in silicon processing / _ceditor, Yale Strausser ; consulting editors, C. R. Brundle and Gary E. McGuire ; managing editor, Lee E. Fitzpatrick |
| 260 |
_aBoston : _bButterworth-Heinemann, _c1993 |
||
| 300 |
_a240 p. : _bill. ; _c24 cm. |
||
| 440 | 0 | _aMaterials characterization series | |
| 504 | _aincludes bibliographical references and index | ||
| 650 | 0 | _aSilicon | |
| 650 | 0 | _aElectric conductors | |
| 650 | 0 | _aSemiconductor films | |
| 650 | 0 | _aSurface chemistry | |
| 700 | 1 | _aStrausser, Yale | |
| 907 |
_a.b10325190 _b2021-05-28 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kQC611.8.S5C48 |
||
| 914 | _avtls000033946 | ||
| 991 | _aFakulti Kejuruteraan | ||
| 998 |
_at _b1999-05-08 _cm _da _feng _gxxu _y0 _z.b10325190 |
||
| 999 |
_c34506 _d34506 |
||