000 01274nam a2200313 a 4500
005 20250930115350.0
008 040120s2002 ne a b 101 0 eng
010 _a2002-072962
020 _a1402005245 (alk. paper)
_cRM627.12
039 9 _a200402170857
_bhamudah
_c200402161558
_dnuri
_c200402111152
_dfarid
_c200401201151
_dsanusi
_y01-20-2004
_zsanusi
090 _aTA418.9.T45C483 3
090 _aTA418.9
245 0 0 _aChemical physics of thin film deposition processes for micro- and nano-technologies /
_cedited by Yves Pauleau
260 _aDordrecht :
_bKluwer Academic Publishers,
_c2002
300 _axiii, 363 p. :
_bill. ;
_c25 cm.
440 0 _aNATO science series.
_nSeries II,
_pMathematics, physics, and chemistry ;
_vv. 55
500 _a'Published in cooperation with NATO Scientific Affairs Division.'
504 _aIncludes bibliographical references and index
650 0 _aThin films
_vCongresses
650 0 _aNanotechnology
_vCongresses
700 1 _aPauleau, Yves
_954294
907 _a.b13320026
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTA418.9.T45C483 3
914 _avtls000346886
990 _afa
991 _aInstitut Kejuruteraan Mokro & Nanoelektronik
998 _ad
_b2004-07-01
_cm
_da
_feng
_gne
_y0
_z.b13320026
999 _c331413
_d331413