| 000 | 00756nam a2200253 a 4500 | ||
|---|---|---|---|
| 005 | 20250914084217.0 | ||
| 008 | 981208s1956 xxk 00 eng | ||
| 020 | _a0412053802 | ||
| 039 | 9 |
_y08-18-1999 _zload |
|
| 090 |
_aTS695 _b.H6 |
||
| 100 | 1 | _aHolland, L | |
| 245 | 1 | 0 |
_aVacuum deposition of thin films _cL. Holland, with a foreword by S. Tolansky |
| 260 |
_aLondon _bChapman & Hall _c1956 |
||
| 300 |
_a541 p. : _bill. ; _c23 cm. |
||
| 504 | _ap. 519-581. | ||
| 650 |
_aVapour _xPlating |
||
| 907 |
_a.b12435478 _b2025-02-18 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTS695 .H6 |
||
| 914 | _avtls000251107 | ||
| 990 | _arudi | ||
| 991 | _aFakulti Sains Fizik dan Gunaan | ||
| 998 |
_al _b1999-05-08 _cm _da _feng _gxxk _y0 _z.b12435478 |
||
| 999 |
_c244800 _d244800 |
||