000 00990nam a2200265 a 4500
005 20250914080945.0
008 981208s1996 my 00 eng
039 9 _a201212131627
_byah
_y08-18-1999
_zload
090 _aTK7871.95.K37 1996 3tesis
090 _aTK7871.95
_b.K37 1996 3
100 1 _aKarim, Mohammed Fakhrul
245 1 0 _aStudy of tunneling and breakdown mechanisms of gate oxide in MOSFET
_cMohammed Fakhrul Karim
260 _aUniversiti Kebangsaan Malaysia, Bangi
_bFaculty of Engineering
_c1996
300 _a129 p. : ill. ; 30 cm.
502 _aThesis (M.Sc.) - Universiti Kebangsaan Malaysia, 1996
504 _aReferences : p. 118-123
650 0 _aMetal oxide semiconductor field
_xeffect transistors
907 _a.b12241210
_b2025-07-18
_c2019-11-12
942 _c3
_n0
_kTK7871.95.K37 1996 3tesis
914 _avtls000231254
990 _altm
991 _aFakulti Kejuruteraan
998 _al
_b1999-05-08
_cm
_dx
_feng
_gmy
_y0
_z.b12241210
999 _c225518
_d225518