| 000 | 00837nam a2200265 a 4500 | ||
|---|---|---|---|
| 005 | 20250914064947.0 | ||
| 008 | 981208s1975 xxu 00 eng | ||
| 020 | _a0070162301 | ||
| 039 | 9 |
_y08-18-1999 _zload |
|
| 090 |
_aTK7874 _b.D42 |
||
| 100 | 1 | _aDeForest, William S. | |
| 245 | 1 | 0 |
_aPhotoresist : _bmaterials and processes / _cW. S. DeForest. |
| 260 |
_aNew York : _bMcGraw-Hill Book, _c1975. |
||
| 300 |
_axi, 269 p. : _bill. ; _c24 cm. |
||
| 504 | _aIncludes bibliographical references and index. | ||
| 650 | 0 | _aPhotoresists. | |
| 650 | 0 | _aIntegrated circuits. | |
| 650 | 0 | _aPrinted circuits. | |
| 907 |
_a.b1176904x _b2022-01-14 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTK7874 .D42 |
||
| 914 | _avtls000183104 | ||
| 991 | _aFakulti Kejuruteraan | ||
| 998 |
_al _b1999-05-08 _cm _da _feng _gxxu _y0 _z.b1176904x |
||
| 999 |
_c178519 _d178519 |
||