000 01054nam a2200289 a 4500
005 20250930102103.0
008 981208s1989 xxu 00 eng
020 _a0841214751
_cRM133.49
039 9 _a201809191456
_bhayat
_c200107061715
_djoriah
_y08-18-1999
_zload
090 _aTK7874.M4835
090 _aTK7874
_b.M4835
245 0 0 _aMicroelectronics processing :
_bchemical engineering aspects /
_cDennis W. Hess and Klaus F. Jensen ; editors.
260 _aWashington, D.C. :
_bAmerican Chemical Society ,
_c1989.
300 _a547 p. :
_bill. ;
_c23 cm.
440 0 _aAdvances in chemistry series ;
_vv.221
650 0 _aMicroelectronics
_xMaterials.
_960417
650 0 _aIntegrated circuits
_xDesign and construction.
650 0 _aSurface chemistry.
700 1 _aHess, Dennis W.
700 1 _aJensen, Klavs F.
907 _a.b11475249
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTK7874.M4835
914 _avtls000152930
991 _aFakulti Kejuruteraan
998 _al
_b1999-05-08
_cm
_da
_feng
_gxxu
_y0
_z.b11475249
999 _c149194
_d149194