000 01101nam a2200349 a 4500
005 20250913134745.0
008 981208s1976 xxk 00 eng
020 _a0126969507
035 _a599417
039 9 _a201406301228
_bjamil
_y08-18-1999
_zload
040 _aUKM
090 _aQC702.7.I55T67
090 _aQC702.7.I5
_bT67
100 1 _aTownsend, P. D.
_q(Peter David)
245 1 0 _aIon implantation, sputtering and their applications /
_cby P. D. Townsend, J. C. Kelly, N. E. W. Hartley.
260 _aLondon :
_bAcademic Press,
_c1976
300 _a333 p. :
_bill. ;
_c24 cm.
504 _aincludes bibliographical reference
590 _a1
650 0 _aIon implantation.
650 0 _aSputtering (Physics).
700 1 _aKelly, J. C.
_q(John Clive).
700 1 _aHartley, N. E. W.
907 _a.b11146527
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kQC702.7.I55T67
914 _avtls000119150
990 _azry
991 _aFakulti Sains Fizik dan Gunaan
998 _at
_b1999-05-08
_cm
_da
_feng
_gxxk
_y0
_z.b11146527
999 _c116432
_d116432