000 01266nam a2200361 a 4500
005 20250930100404.0
008 981208s1975 xxua 00 eng
020 _a0306674017 (v.1)
020 _a0306674025 (v.2)
035 _a13483
039 9 _a201406301226
_bjamil
_c200210121115
_dtrainer
_y08-18-1999
_zload
040 _aUKM
090 _aQC793.3.E5B74[00008041334]
090 _aQC193.3.E5
_bB74
100 1 _aBrice, David K.
_935535
245 1 0 _aIon implantation range and energy deposition distributions /
_cDavid K. Brice.
260 _aNew York :
_bPlenum Press,
_c1975
300 _a2 v. :
_bill. ;
_c28 cm.
504 _aIncludes bibliographical references.
505 _gv. 1
_tHigh incident ion energies -
_gv.2
_tLow incident ion energies.
590 _a2
650 0 _aIon implantation.
700 1 _aWinterbon, K. Bruce.
740 0 _aHigh incident ion energies ;
_nv.1
_aLow incident ion energies ;
_nv.2
907 _a.b11146515
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kQC793.3.E5B74[00008041334]
914 _avtls000119149
991 _aFakulti Sains Fizik dan Gunaan
991 _aFakulti Sains dan Sumber Alam
998 _at
_b1999-05-08
_cm
_da
_feng
_gxxu
_y0
_z.b11146515
999 _c116431
_d116431