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1.
Glow discharge processes : sputtering and plasma etching / Brian Chapman by
Publication details: New York : Wiley, 1980
Availability: Items available for loan: PERPUSTAKAAN TUN SERI LANANG (1)Call number: QC702.7.P6C48.

2.
Ion bombardment modification of surfaces : fundamentals and applications / edited by Orlando Auciello and Roger Kelly. by Series: Beam modification of materials ; 1
Publication details: Amsterdam : Elsevier North-Holland, 1984
Availability: Items available for loan: PERPUSTAKAAN LINGKUNGAN KEDUA (1)Call number: TA418.7.I65 1984.

3.
Ion implantation, sputtering and their applications / by P. D. Townsend, J. C. Kelly, N. E. W. Hartley. by
Publication details: London : Academic Press, 1976
Availability: Items available for loan: PERPUSTAKAAN TUN SERI LANANG (1)Call number: QC702.7.I55T67.

4.
Sputtering by particle bombardment / edited by R. Behrisch with contributions by H.H. Anderson ... [et al.]. by Series: Topics in applied physics ; v. 47
Publication details: Berlin : Springer-Verlag, 1981
Availability: Items available for loan: PERPUSTAKAAN TUN SERI LANANG (1)Call number: QC176.8.S72 S68.

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Sputtering materials for VLSI and thin film devices / Jaydeep Sarkar. by Publisher: Waltham, USA : Elsevier, WA, William Andrew is an imprint of Elsevier, 2014
Availability: No items available.

7.
Thin film processing and characterization of high-temperature superconductors, Anaheim, CA. 1987 / edited by James M. E. Harper, Richard J. Calton, Leonard L. Peldman. by Series: American Institute of Physics Conference proceedings
Publication details: New York : American Institute of Physics, 1988
Availability: Items available for loan: PERPUSTAKAAN TUN SERI LANANG (1)Call number: QC611.9 .T47.

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