Silicon technologies :  ion implantation and thermal treatment / 
edited by Annie Baudrant. 
 - London :  Wiley,  2011. 
 - xvii, 337 p. :  ill. ;  24 cm. 
<br/><br/>Includes bibliographical references and index. 
<br/><br/> The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. 
<br/><br/><label>ISBN: </label>9781848212312 (hbk) 
<br/><br/><label>LCCN: </label>2011-008131 
<br/><br/><label>Nat. Bib. Agency Control No.: </label>015786521  Uk 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Semiconductor doping.<br/>Ion implantation.<br/>Semiconductors--Heat treatment.