Intellectual property law in China /
by Peter Ganea and Thomas Pattloch ; editor, Christopher Heath
- [Munich] : The Hague : Max Planck Institute for Foreign and International Patent, Copyright, and Competition Law ; Kluwer Law International, 2005
- xv, 388 p. ; 25 cm.
- Max Planck series on Asian intellectual property law ; v. 11 .
- Max Planck series on Asian intellectual property law ; 11 .