Extreme ultraviolet lithography /

Extreme ultraviolet lithography / [edited by] Banqiu Wu, Ajay Kumar. - New York : McGraw-Hill, 2009 - xiv, 465 p. : ill. ; 24 cm.

Includes bibliographical references and index

9780071549189 (hbk.) RM362.25 0071549188 (hbk.)


Extreme ultraviolet lithography
Integrated circuits--Masks
Integrated circuits--Design and construction

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