Ferroelectric Thin Films Basic Properties and Device Physics for Memory Applications /
Ferroelectric Thin Films Basic Properties and Device Physics for Memory Applications / [electronic resource] :
edited by Yoshihiro Ishibashi, Masanori Okuyama.
- Berlin Heidelberg : Springer-Verlag GmbH., 2005
- xiii, 244 p. : ill., digital ; 24 cm.
- Topics in Applied Physics, 98 0303-4216 ; .
9783540314790 (electronic bk.) 9783540241638 (paper)
Thin films.
Ferroelectricity.
Physics.
Crystallography.
Electronics and Microelectronics, Instrumentation.
Magnetism, Magnetic Materials.
Metallic Materials.
Physics and Applied Physics in Engineering.
TA418.9.T45 / F465 2005
621.39732
9783540314790 (electronic bk.) 9783540241638 (paper)
Thin films.
Ferroelectricity.
Physics.
Crystallography.
Electronics and Microelectronics, Instrumentation.
Magnetism, Magnetic Materials.
Metallic Materials.
Physics and Applied Physics in Engineering.
TA418.9.T45 / F465 2005
621.39732
