The chemistry of metal CVD /
The chemistry of metal CVD /
edited by Toivo T. Kodas and Mark J. Hampden-Smith
- Weinheim : VCH, 1994
- xxiv, 530 p. : ill. ; 24 cm.
Bibliography : p. 417-427
3527290710
94-022847
Electronic circuit design
Chemical vapor deposition
Metallic films
Bibliography : p. 417-427
3527290710
94-022847
Electronic circuit design
Chemical vapor deposition
Metallic films
